NANOGRAFI.COM KEYWORD DENSITY CHECKER

Total words: 8383 | 2-word phrases: 1746 | 3-word phrases: 2661 | 4-word phrases: 3292

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Title Try to keep the title under 60 characters (25 characters)
Nanografi Nano Technology
Description Try to keep the meta description between 50 - 160 characters (205 characters)
Nanografi Nanotechnology offers top-notch advanced materials solutions like graphene, carbon nanotubes, nanoparticles, microparticles, battery & lab equipment, quantum dots & more. #beyondthefuture
Keywords Meta keywords are not recommended anymore (205 characters)
carbon nanotubes, graphene, graphene oxide, graphene sheets, graphene nanoplatelets, graphene dispersion, graphene aerogels, quantum dots, nanoparticles, nanocellulose, microparticles, nanopowder, micron powder, micropowder, fullerene, silicon wafer, semiconductor wafer, dispersions, battery equipment, foils for battery, lithium battery materials, coin cell materials, battery raw materials, rare earth materials, sputtering targets, shape memory materials, lab equipment, dispersion equipment, disperser, hydrothermal synthesis autoclave reactors, sonicator, ultrasonic homogenizer, three roll mills, triple roll mill, high energy ball mill, solid film lubricants, nanotechnology
H1 No H1 tag on the page (0 characters)

ONE WORD PHRASES 684 Words

# Keyword H1 Title Des Volume Position Suggest Frequency Density
1sputtering43463.45%
2targets43062.87%
3powder38456.14%
4all33248.54%
5oxide29643.27%
6micron27440.06%
7nanoparticles26939.33%
8321130.85%
9221030.70%
10420630.12%

TWO WORD PHRASES 1746 Words

# Keyword H1 Title Des Volume Position Suggest Frequency Density
1sputtering target37421.42%
2sputtering targets37021.19%
3micron powder23413.40%
42 319811.34%
5targets all18610.65%
61 218410.54%
73 418410.54%
8targets 11729.85%
9oxide micron824.70%
10oxide sputtering704.01%
11oxide nanoparticles663.78%
126 8663.78%
134 6583.32%
145 6402.29%
154 5402.29%
16carbon nanotube382.18%
17   362.06%
18y powder301.72%
19powder al281.60%
20alloy powder261.49%

THREE WORD PHRASES 2661 Words

# Keyword H1 Title Des Volume Position Suggest Frequency Density
11 2 31786.69%
22 3 41746.54%
3targets 1 21726.46%
4sputtering targets all1626.09%
5sputtering targets 11385.19%
6oxide micron powder682.56%
7oxide sputtering targets562.10%
83 4 6542.03%
94 6 8501.88%
104 5 6401.50%
113 4 5381.43%
12     230.86%
135 6 7220.83%
146 7 8200.75%
15choose options quick170.64%
16nanotube wire diameter150.56%
17options quick view150.56%
18sputtering targets names140.53%
19micron powder al140.53%
205 6 8140.53%
21titanate sputtering targets140.53%
22sputtering targets 2120.45%
23targets 2 3120.45%
24indium sputtering targets120.45%
25nitride sputtering targets120.45%
26carbon nanotube wire120.45%
27micron powder all100.38%
28erbium oxide sputtering100.38%
29targets all bismuth100.38%
30lanthanum strontium manganate100.38%

FOUR WORD PHRASES 3292 Words

# Keyword H1 Title Des Volume Position Suggest Frequency Density
1targets 1 2 31685.10%
21 2 3 41564.74%
3sputtering targets 1 21384.19%
42 3 4 6481.46%
53 4 6 8481.46%
63 4 5 6381.15%
72 3 4 5361.09%
8oxide sputtering targets all320.97%
94 5 6 7220.67%
105 6 7 8200.61%
11oxide sputtering targets 1180.55%
12       160.49%
134 5 6 8140.43%
14choose options quick view140.43%
15sputtering targets 2 3120.36%
16targets 2 3 4100.30%
17carbon nanotube wire diameter100.30%
18erbium oxide sputtering targets100.30%
19sputtering targets all bismuth80.24%
20all sputtering targets names80.24%
21sputtering targets all barium80.24%
22nitride sputtering targets 180.24%
23was choose options quick80.24%
244 6 8 molybdenum60.18%
25sputtering targets all tungsten60.18%
26wafers 2” 3” 460.18%
272 3 4 indium60.18%
28lanthanum calcium manganate la07ca03mno360.18%
29sputtering targets all zinc60.18%
30indium sputtering targets 160.18%
31€       60.18%
32wafers 2 3 460.18%
33sputtering targets all titanium60.18%
34lanthanum strontium manganate la09sr01mno360.18%
35sputtering targets all nickel60.18%
36indium tin oxide ito60.18%
37carbide sputtering targets all60.18%
38sputtering targets all lanthanum60.18%
39strontium titanate sputtering targets60.18%
40titanate sputtering targets all60.18%

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